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? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ?Cmppad?Photoelectric Technology Co. Ltd.

东莞市欣帕得光电科技有限公司

Cmppad?Photoelectric Technology Co. Ltd.

Chemical?Mechanical?Polishing?Pad

  • Cerium Oxide Polishing Pads\wafer Polishing Pads
  • Cerium Oxide Polishing Pads,wafer Polishing Pads
  • Cerium Oxide Polishing Pads\wafer Polishing Pads
  • Cerium Oxide Polishing Pads\wafer Polishing Pads
  • Cerium Oxide Polishing Pads\wafer Polishing Pads
  • CMP polishing pad
  • wafer Polishing Pads
  • CMP polishing pad
  • CMP polishing pad
  • CMP polishing pad
  • Cerium Oxide Polishing Pads\wafer Polishing Pads
  • Cerium Oxide Polishing Pads\wafer Polishing Pads

Cerium Oxide Polishing Pads\wafer Polishing Pads

Model No.︰

1112

Brand Name︰

Cerium Oxide Polishing Pads\wafer Polishing Pads

Country of Origin︰

China

Unit Price︰

CNY ¥ 180 / pc

Minimum Order︰

100 pc

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Product Description

Cerium Oxide Polishing Pads
polishing pads are ideal for use in high precision polishing of all types of semiconductor crystal materials, including silicon wafers, and also metals and glass. SUNHIN has been designed to produce a super fine polished surface which is scratch-free, damage-free, and without defects of any kind. From the many types of polishing pads available, the exact type can be selected to match each job. The polishing pad can be chosen in the form of a roll or disk cut into made-to-order sizes. The product can also be ordered with a double-sided adhesive film attached to the back of the pad, for quick and easy installation.
 


Product Image

Cerium Oxide Polishing Pads,wafer Polishing Pads  Cerium Oxide Polishing Pads,wafer Polishing Pads

CMP polishing pad  CMP polishing pad

wafer Polishing Pads  wafer Polishing Pads

CMP polishing pad  CMP polishing pad

CMP polishing pad  CMP polishing pad

CMP polishing pad  CMP polishing pad